Mass spectrometry diagnostic of dc magnetron reactive sputtering

Journal of Analytical Atomic Spectrometry

Volumn 18, Issue 6, 2003, Pages 618-623

  Snyders, R ^a   Gouttebaron, R ^a   Dauchot, J P ^a   Hecq, M ^a  

^a UNIVERSITY OF MONS   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING ENERGY; CHEMICAL BONDS; DEPOSITION; ELECTRIC POTENTIAL; MASS SPECTROMETRY; PLASMA APPLICATIONS; SILVER; TIN; TITANIUM; X RAY PHOTOELECTRON SPECTROSCOPY;

REACTIVE SPUTTERING;

MAGNETRON SPUTTERING;

EID: 0038545824     PISSN: 02679477     EISSN: None     Source Type: Journal    
DOI: 10.1039/b300438d     Document Type: Article

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