Impact of fluorine co-implant on boron diffusion during non-melt laser annealing

AIP Conference Proceedings

Volumn 866, Issue , 2006, Pages 21-24

  Noda, T ^a,b   Felch, S ^c   Parihar, V ^c   Vrancken, C ^b   Janssens, T ^b   Bender, H ^b   Van Daele, B ^b   Vandervorst, W ^b  

^a PANASONIC CORPORATION   (Japan)

^b IMEC   (Belgium)

^c APPLIED MATERIALS INC   (United States)

Author keywords

Co implant; Fluorine; Millisecond annealing; Non melt laser annealing; Transient enhanced diffusion

Indexed keywords

EID: 33846959133     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2401452     Document Type: Conference Paper

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