Atomistic modeling of point and extended defects in crystalline materials

Materials Research Society Symposium - Proceedings

Volumn 532, Issue , 1998, Pages 43-53

  Jaraiz, Martin ^a   Pelaz, Lourdes ^a   Rubio, Emiliano ^a   Barbolla, Juan ^a   Gilmer, George H ^a   Eaglesham, David J ^a   Gossmann, Hans J ^a   Poate, John M ^a  

^a UNIVERSITY OF VALLADOLID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPUTER SIMULATION; CRYSTAL ATOMIC STRUCTURE; DIFFUSION IN SOLIDS; ION IMPLANTATION; MONTE CARLO METHODS; OBJECT ORIENTED PROGRAMMING; POINT DEFECTS;

ATOMISTIC PROCESS MODEL;

CRYSTALLINE MATERIALS;

EID: 0031636420     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-532-43     Document Type: Conference Paper

References (10)