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Volumn , Issue , 2004, Pages 174-175
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Ultra-shallow junction formation by non-melt laser spike annealing for 50-nm gate CMOS
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
ELECTRIC LINES;
EPITAXIAL GROWTH;
LASER BEAM CUTTING;
LEAKAGE CURRENTS;
MASKS;
MOSFET DEVICES;
OPTIMIZATION;
SEMICONDUCTOR JUNCTIONS;
TRANSMISSION ELECTRON MICROSCOPY;
LASER ANNEALING;
OFFSET SPACERS;
RAPID THERMAL ANNEALING (LSA);
SOLID PHASE EPITAXY;
CMOS INTEGRATED CIRCUITS;
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EID: 4544244756
PISSN: 07431562
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/vlsit.2004.1345463 Document Type: Conference Paper |
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Times cited : (58)
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References (7)
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