Nanomechanical structures with 91 MHz resonance frequency fabricated by local deposition and dry etching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 4, 2004, Pages 1658-1661

  Kim, G M ^a,c   Kawai, S ^b   Nagashio, M ^b   Kawakatsu, H ^b   Brugger, J ^a  

^a EPFL   (Switzerland)

^b INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

^c Kyungpook National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; INDUCTIVELY COUPLED PLASMA; INTEGRATED CIRCUITS; INTERFEROMETERS; ION BEAMS; MICROMACHINING; NATURAL FREQUENCIES; PHOTOLITHOGRAPHY; PLASMA ETCHING; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

LOCAL DEPOSITION; NANOELECTROMECHANICAL SYSTEMS (NEMS); NANOSTENCILS; WAVELENGTHS;

NANOSTRUCTURED MATERIALS;

EID: 4944263962     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1761240     Document Type: Article

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