Electrical and reliability characteristics of HfO2 MOS capacitor with Mo metal gate electrode

Journal of the Korean Physical Society

Volumn 49, Issue SUPPL. 3, 2006, Pages

  Park, In Sung ^a   Lee, Taeho ^b   Ko, Hankyong ^a   Ahn, Jinho ^a  

^a Hanyang University   (South Korea)

^b The University of Texas at Austin   (United States)

Author keywords

HfO2; Metal electrode; Reliability; Work function rolling off

Indexed keywords

EID: 33846387145     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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