Silated acidic copolymers for nanoimprint lithography on flexible plastic substrates

Microelectronic Engineering

Volumn 84, Issue 1, 2007, Pages 129-135

  Liao, Wen chang ^a   Hsu, Steve Lien Chung ^a   Lin, Jui Chen ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Flexible plastic substrate; Nanoimprint lithography; Reactive ion etching resistability; Silated acidic polymer

Indexed keywords

FREE RADICAL POLYMERIZATION; LITHOGRAPHY; ORGANIC SOLVENTS; PLASTICS; POLYETHYLENE TEREPHTHALATES; POLYMETHYL METHACRYLATES; REACTIVE ION ETCHING;

ACIDIC POLYMERS; METHACRYLIC ACID; METHYLMETHACRYLATE; NANOIMPRINT LITHOGRAPHY;

COPOLYMERS;

EID: 33751428370     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.09.002     Document Type: Article

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