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Volumn 78-79, Issue 1-4, 2005, Pages 496-502
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Design of low Tg thermosets for short cycle time nanoimprint lithography
a
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Author keywords
Allyl polymers; Free radical initiation; Glass transition temperature; Low imprint temperature; Nanoimprint lithography; Plasticizers; Short imprint time
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Indexed keywords
ACETONE;
CROSSLINKING;
CURING;
DIFFERENTIAL SCANNING CALORIMETRY;
FREE RADICALS;
GLASS TRANSITION;
HEATING;
NANOTECHNOLOGY;
PLASTIC FILMS;
PLASTICIZERS;
POLYMERIZATION;
THERMODYNAMIC STABILITY;
THERMOPLASTICS;
ALLYL POLYMERS;
LOW IMPRINT TEMPERATURE;
NANOIMPRINT LITHOGRAPHY;
SHORT IMPRINT TIME;
THERMOSETS;
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EID: 14944358720
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mee.2004.12.063 Document Type: Conference Paper |
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Times cited : (4)
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References (4)
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