Thermal stabilities of metal bottom electrodes for Ta2O5 metal-oxide-metal capacitor structure

Current Applied Physics

Volumn 7, Issue 2, 2007, Pages 124-134

  Kim, Sam Dong ^a  

^a Dongguk University   (South Korea)

Author keywords

Bottom electrode; MOM capacitor; Ta2O5; Thermal stability

Indexed keywords

CAPACITORS; CHEMICAL VAPOR DEPOSITION; LEAKAGE CURRENTS; OXIDATION; SURFACE REACTIONS; THERMODYNAMIC STABILITY;

BOTTOM ELECTRODE; EFFECTIVE OXIDE THICKNESS; MOM CAPACITOR; TA2O5;

ELECTRODES;

EID: 33751239142     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2006.02.007     Document Type: Article

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