NiCr bottom electrodes for Ta2O5 high dielectric thin films in metal-insulator-metal capacitors

Integrated Ferroelectrics

Volumn 47, Issue , 2002, Pages 41-48

  Lee, Eung Min ^a   Yoon, Soon Gil ^a  

^a Chungnam National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; DIELECTRIC MATERIALS; MIM DEVICES; PERMITTIVITY; TANTALUM COMPOUNDS; THIN FILMS;

ANNEALING TEMPERATURE; BOTTOM ELECTRODES; DISSIPATION FACTORS; METAL-INSULATOR-METAL CAPACITORS;

ELECTRODES;

EID: 12744277257     PISSN: 10584587     EISSN: 16078489     Source Type: Journal    
DOI: 10.1080/713718288     Document Type: Article

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