Thermal stability of Ta2O5 in metal-oxide-metal capacitor structures

Applied Physics Letters

Volumn 74, Issue 24, 1999, Pages 3705-3707

  Chang, J P ^a   Steigerwald, M L ^a   Fleming, R M ^a   Opila, R L ^a   Alers, G B ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION IN SOLIDS; INTERFACES (MATERIALS); RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING FILMS; SEMICONDUCTOR DEVICE STRUCTURES; TANTALUM COMPOUNDS; THERMAL EFFECTS; THERMODYNAMIC STABILITY; TITANIUM NITRIDE; TUNGSTEN COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

TANTALUM NITRIDE; TANTALUM OXIDE; TUNGSTEN NITRIDE;

MOS CAPACITORS;

EID: 0032613579     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.123227     Document Type: Article

References (12)

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