Photoelectrodeposition of thin Co films on p-Si from sulfate solutions

Surface and Coatings Technology

Volumn 201, Issue 6, 2006, Pages 3030-3037

  Munoz A G ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

Co; Electrodeposition; p Si; Photoelectrodes

Indexed keywords

ATOMIC FORCE MICROSCOPY; COBALT; CYCLIC VOLTAMMETRY; SCHOTTKY BARRIER DIODES; SURFACE ROUGHNESS; THIN FILMS;

PHOTOELECTRODEPOSITION; PHOTOGENERATED ELECTRONS; POWER SPECTRAL DENSITY;

ELECTRODEPOSITION;

ATOMIC FORCE MICROSCOPY; COBALT; CYCLIC VOLTAMMETRY; ELECTRODEPOSITION; SCHOTTKY BARRIER DIODES; SURFACE ROUGHNESS; THIN FILMS;

EID: 33751211518     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.06.012     Document Type: Article

References (39)

1. Oskam G., van Heerden D., and Searson P.C. Appl. Phys. Lett. 73 (1998) 3241
2. Zambelli T., Munford M.L., Pillier F., Bernard M.-C., and Allongue P. J. Electrochem. Soc. 148 (2001) C614
3. Tumanski S. Thin Film Magnetoresistive Sensors (2001), Institute of Physics Publishing, Bristol
4. Mahdi A.E., Panina L., and Mapps D. Sens. Actuators, A, Phys. 105 (2003) 271
5. Moina C.A., de Oliveira-Versic L., and Vazdar M. Mater. Lett. 58 (2004) 3518
6. Moina C.A., and Vazdar M. Electrochem. Commun. 3 (2001) 159
7. Munford M.L., Sartorelli M.L., Seligman L., and Pasa A.A. J. Electrochem. Soc. 149 (2002) C274
8. Pasa A.A., and Schwarzacher W. Phys. Status Solidi 173 (1999) 73
9. Seligman L., Sartorelli M.L., Pasa A.A., Schwarzacher W., and Kasyutich O.I. J. Mag. Mag. Mat. 226-230 (2001) 752
10. Lopez-Díaz L., Klaui M., Rothmann J., and Bland J.A.C. J. Magn. Magn. Mater. 242-245 (2002) 553
11. Oskam G., Long J.G., Natarajan A., and Searson P.C. J. Phys., D. Appl. Phys. 31 (1998) 1927
12. Gorostiaga P., Díaz R., Servat J., and Sanz F. J. Electrochem. Soc. 144 (1997) 909
13. Ji C., Oskam G., and Searson P.C. J. Electrochem. Soc. 148 (2001) C746
14. Oskam G., and Searson P.C. Surf. Sci. 446 (2000) 103
15. Warren S., Reitzle A., Kazimirov A., Ziegler J.C., Bunk O., Cao L.X., Renner F.U., Kolb D.M., Bedzyk M.J., and Zegenhagen J. Surf. Sci. 496 (2002) 287
16. Stieger R.M., Gorer S., Craft B., and Penner R.M. Langmuir 15 (1999) 790
17. Márquez K., Staikov G., and Schultze J.W. Electrochim. Acta 48 (2003) 875
18. Rashkova B., Guel B., Pötzschke R.T., Staikov G., and Lorenz W.J. Electrochim. Acta 43 (1998) 3021
19. Ziegler J.C., Wielgosz R.I., and Kolb D.M. Electrochim. Acta 45 (1999) 827
20. Ziegler J.C., Reitzle A., Bunk O., Zegenhagen J., and Kolb D.M. Electrochim. Acta 45 (2000) 4599
21. Souche Y., Lévy J.P., Wagner E., Liénard A., Alvarez-Prado L., and Collins R.T. J. Magn. Magn. Mater. 242-245 (2002) 578
22. A.G. Muñoz, G. Staikov, J. Solid State Electrochem. (2005) 10 (2006) 329.
23. Yoshihara S., Endo K., Sato E., and Bockris J.O.'M. J. Electroanal. Chem. 372 (1994) 91
24. Oskam G., Hoffmann P.M., and Searson P.C. Phys. Rev. Lett. 76 (1996) 1521
25. Muñoz A.G., and Lohrengel M.M. Electrochim. Acta 47 (2002) 2751
26. Yin K.-M., and Lin B.-T. Surf. Coat. Technol. 78 (1996) 205
27. Koleske D.D., Coltrin M.E., Cross K.C., Mitchell C.C., and Allerman A.A. J. Cryst. Growth 273 (2004) 86
28. Ruppe C., and Duparré A. Thin Solid Films 288 (1996) 8
29. Jacobs S., Duparré A., and Truckenbrodt H. Appl. Opt. 37 (1998) 1180
30. Duparré A., and Jacobs S. Appl. Opt. 35 (1996) 5052
31. Tong W.M., and Williams R.S. Annu. Rev. Phys. Chem. 45 (1994) 401
32. Palasantzas G. Phys. Rev., B 48 (1993) 14472
33. Ferré-Borrul J., Duparré A., and Quesnel E. Appl. Opt. 40 (2001) 2190
34. Church E.L. Appl. Opt. 27 (1988) 1518
35. Gómez E., Marín M., Sanz F., and Vallés E. J. Electroanal. Chem. 422 (1997) 139
36. Muñoz A.G., and Staikov G. Electrochim. Acta 51 (2006) 2836
37. Radisic A., Oskam G., and Searson P.C. J. Electrochem. Soc. 151 (2004) C369
38. Ku J.-H., and Nemanich R.J. Appl. Surf. Sci. 104 (1996) 262
39. Sullivan J.P., Tung R.T., Eaglesham D.J., Schrey F., and Graham W.R. J. Vac. Sci. Technol., B 11 (1993) 1564