Co/Cu spin valves electrodeposited on Si

Journal of Magnetism and Magnetic Materials

Volumn 226-230, Issue PART I, 2001, Pages 752-753

  Seligman, L ^a   Sartorelli, M L ^a   Pasa, A A ^a   Schwarzacher, W ^b   Kasyutich, O I ^b  

^a FEDERAL UNIVERSITY OF SANTA CATARINA   (Brazil)

^b UNIVERSITY OF BRISTOL   (United Kingdom)

Author keywords

Electrodeposition; Magnetoresistance; Multilayers metallic; Spin valve

Indexed keywords

CORROSION; ELECTRODEPOSITION; ELECTRODES; MAGNETIC DEVICES; MULTILAYERS; SILICON;

ANTIFERROMAGNETICS; CO/CU MULTILAYERS; FIELD SENSITIVITY; LAYER THICKNESS; MAGNETORESISTIVE; MULTILAYERS-METALLIC; SPIN VALVE; SPIN VALVE STRUCTURE;

MAGNETORESISTANCE;

EID: 33748705743     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(00)00888-X     Document Type: Article

References (2)

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