Atomic force microscopy study of the silicon doping influence on the first stages of platinum electroless deposition

Journal of the Electrochemical Society

Volumn 144, Issue 3, 1997, Pages 909-914

  Gorostiza, Pau ^a   Diaz, Raül ^a   Servat, Jordi ^a   Sanz, Fausto ^a,b   Morante, Joan Ramon ^a  

^a UNIVERSITY OF BARCELONA   (Spain)

^b ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; MORPHOLOGY; PLATINUM; POLYCRYSTALLINE MATERIALS; REDOX REACTIONS; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; SUBSTRATES; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

METAL DEPOSITION; PLATINUM SILICIDE;

ELECTROLESS PLATING;

EID: 0031101611     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837506     Document Type: Article

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