Electrodeposition of thin films and multilayers on silicon

Physica Status Solidi (A) Applied Research

Volumn 173, Issue 1, 1999, Pages 73-84

  Pasa, A A ^a   Schwarzacher, W ^b  

^a FEDERAL UNIVERSITY OF SANTA CATARINA   (Brazil)

^b UNIVERSITY OF BRISTOL   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT; COPPER; CYCLIC VOLTAMMETRY; ELECTRIC CURRENTS; MAGNETORESISTANCE; MULTILAYERS; NICKEL; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SOLUTIONS; THIN FILMS;

BORIC ACID; MAXIMUM GIANT MAGNETORESISTIVE; POTENTIOSTATIC CONDITIONS; REGULAR GRANULARITY; SODIUM SULPHATE;

ELECTRODEPOSITION;

EID: 0033362885     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-396X(199905)173:1<73::AID-PSSA73>3.0.CO;2-8     Document Type: Article

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