Photoelectrodeposition of patterned cobalt films on silicon substrates

Journal of Magnetism and Magnetic Materials

Volumn 242-245, Issue PART I, 2002, Pages 578-580

  Souche, Y ^a   Levy J P ^a   Wagner, E ^a   Lienard A ^a   Alvarez Prado, L ^b   Collins, R T ^a,c  

^a LABORATOIRE DE CRISTALLOGRAPHIE   (France)

^b C Julian C   (Spain)

^c Department of Geology and Geological Engineering   (United States)

Author keywords

Electrodeposition; Ferromagnetic films; Pattern formation; Thin films magnetic

Indexed keywords

COBALT; DIFFRACTION GRATINGS; ELECTRODEPOSITION; ELECTRONS; FERROMAGNETIC MATERIALS; LIGHTING; REDUCTION; SEMICONDUCTING SILICON; SUBSTRATES;

COBALT FILMS; PHOTOELECTRODEPOSITION;

MAGNETIC THIN FILMS;

EID: 0036530501     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(01)01115-5     Document Type: Article

References (6)