Micro and nanolithography for photonic meta-materials and photonic nanostructures

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6320, Issue , 2006, Pages

  Chen, Yifang ^a   Schwanecke, Alexander S ^b   Zheludev, Nikolay I ^b  

^a RUTHERFORD APPLETON LABORATORY   (United Kingdom)

^b UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

Author keywords

e beam resists; Electron beam lithography; Hot embossing; Nanoimprint lithography; Nanolithography; Photonic nanostructures; Planar photonic meta materials; Reactive ion etch; Soft lithography

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; MAGNETIC MATERIALS; NANOSTRUCTURED MATERIALS; NONLINEAR OPTICS; PHOTONS;

E-BEAM RESISTS; HOT EMBOSSING; NANOIMPRINT LITHOGRAPHY; PHOTONIC NANOSTRUCTURES; PLANAR PHOTONIC META-MATERIALS; REACTIVE ION ETCH; SOFT LITHOGRAPHY;

LITHOGRAPHY;

EID: 33751048842     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.678172     Document Type: Conference Paper

References (23)

1. V. A. Fedotov, A. V. Rogacheva, A. S. Schwanecke, P. L. Mladyonov, S. L. Prosvirnin, Y. Chen, and N. I. Zheludev, "'Miracle' mirror that does not change the phase of reflected wave", LEOS 2005 / 18th International Meeting of the IEEE Laser and Electro-Optics Society, Sydney, Australia, 23 - 27 Oct (2005).
2. A. S. Schwanecke, Y. Chen, V. A. Fedotov, V.V. Khardikov, P. L. Mladyonov, S. L. Prosvirnin, A. V. Rogacheva, and N. I. Zheludev, "Magnetic Mirror on Optical Frequency" Nanophotonics Topical Meeting (NANO) at IPRA/NANO OSA Collocated Topical Meetings Uncasville, CT, USA, 24 - 28 Apr (2006).
3. M. V. Bashevoy, F. Jonsson, A. V. Krasavin, N. I. Zheludev, Y. Chen, and M. I. Stockman, "Generation of traveling surface plasmon waves by free-electron impact", Nano Lett. 6(6), 1113-1115 (2006).
4. W. Chen and H. Ahmed, "Fabrication of 5-7 nm wide etched lines in silicon using 100 keV electron-beam lithography and polymethylmethacrylate resist" Appl. Phys. Lett. 62, 1499-1501 (1992).
5. M. J. Loboda, C. M. Grove, and R. F. Schneider, J. Electrochem. Soc. " Properties of a-SiOx : H thin films deposited from hydrogen silsesquioxane resins" 145, 2861-2866 (1998).
6. S. P. Jeng et al., in: Proceeding of VLSI symposium, Kyoto, Japan, 15 (1995).
7. H. Namatsu, Y. Takahashi, K. Yamazake, T. Yamaguchi, M. Nagase, and K. Kurihara, "Three-dimensional siloxane resist for the formation of nanopatterns with minimum linewidth fluctuations" J. Vac. Sci. Technol. B16 69-76 (1998).
8. Yifang Chen and Zheng Cui, "Effects of developing conditions on the contrast and sensitivity of hydrogen silsequioxane " Microelectronic Engineering, 83, 1119-1123 (2006).
9. Y. Chen, D.S. Mcintyre, S. Thorns, "Fabrication of T-Shaped Gates Using UVIII Chemically Amplied DUV Resist and PMMA," Electronics Letters, 35, 338-339 (1999).
10. A. Potts, A. Papakostas, D.M. Bagnall, N.I. Zheludev, Microelectronics Engineering, 73/74, 367 (2003).
11. Yifang Chen, Kaiwu Peng and Zheng Cui, "A lift-off process for high resolution patterns using PMMA/LOR resist stack" Microelectronic Engineering, 73/74, 278-281 (2004).
12. F. J. Garcia de Abajo, Y. Chen, V. A. Fedotov, N. Papasimakis, A. S. Schwanecke, N. I. Zheludev, "Extraordinary light transmission through quasicrystal arrays of holes in a metal film," Photonic Metamaterials: From Random to Periodic, Grand Island, The Bahamas, 5-8 Jun 2006.
13. S. Chou, P. R. Krauss and P. J. Renstrom, Appl. Phys. Lett. 67, 3114 -3116 (1995).
14. L. R. Bao, L. Tan, X. D. Huang, Y.P. Kong, L. J. Guo, S.W. Pang and A. F. Yee, J. Vac. Sci. Technol. B21, 2749 (2003).
15. D. Macintyre, Y. Chen and S. Thorns, J. Vac. Sci. Technol. B20, 2792 (2001).
16. Y. Chen, E. Boyd, D. Moran, D. Macintyre, and S. Thorns, J. Vac Sci. Technol. B20, 2887 (2002).
17. Y. Hirai, S. Harada, H. Kikuta, Y. Tanaka, M. Okano. S. Isaka and M. Kobayasi, "Imprint lithography for curved cross sectional structure using replicated Ni mode" J. Vac. Sci. Technol. B20, 2867-2871 (2002).
18. W. Wu, B. Cui, X. Y. Sun, W. Zhang, L. Zhuang, L. S. Kong and S. Y. Chou, "Large area high density quantised magnetic disks fabricated using nanoimprint lithography" J. Vac. Sci. Technol. B16, 3825-3829 (1998).
19. W. Zhang and S. Y. Chou, "Multlevel nanoimprint lithography with submicron alignment over 4 in. silicont wafers" Appl. Phys. Lett. 79, 845-847 (2001).
20. Y. Chen, Kaiwu Peng and Zheng Cui, Microelectronics Engineering, "Fabrication of ultra-short T gates by a two-step electron beam lithography process" 73/74 278-281 (2004).
21. Jiarui Tao, Yifang Chen, Xingzhong Zhao and Zheng Cui, "A systematic study of dry etch process for profile control of silicon tips" Microelectronics Engineering. 78-79 (2005) 147.
22. Yifang Chen, Jiarui Tao, Xingzhong Zhao and Zheng Cui, Alexander S. Schwanecke, Nikolay I. Zheludev "Nanoimprint lithography for planar photonic meta-materials", Microelectronic Eng., 78/79, 612-617 (2005).
23. Yifang Chen, Jiarui Tao, Xingzhong Zhao, and Zheng Cui, "Study of pattern placement error by thermal expansions in nanoimprint lithography", Journal of Microlithography, Microfabrication, and Microsystems, 5(1), 1-3 (2006).