Nanoimprint lithography for planar chiral photonic meta-materials

Microelectronic Engineering

Volumn 78-79, Issue 1-4, 2005, Pages 612-617

  Chen, Yifang ^a   Tao, Jiarui ^a,b   Zhao, Xingzhong ^b   Cui, Zheng ^a   Schwanecke, Alexander S ^c   Zheludev, Nikolay I ^c  

^a RUTHERFORD APPLETON LABORATORY   (United Kingdom)

^b WUHAN UNIVERSITY   (China)

^c UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

Author keywords

Electron beam lithography; Hydrogen silsequioxane; LOR; Optical activity; Planar chiral structures; PMMA; Reactive ion etch; Room temperature nanoimprint lithography

Indexed keywords

DIELECTRIC MATERIALS; HYDROGEN INORGANIC COMPOUNDS; LIGHT POLARIZATION; LINEAR SYSTEMS; OPTOELECTRONIC DEVICES; PHOTONS; POLYMETHYL METHACRYLATES; REACTIVE ION ETCHING;

HYDROGEN SILSEQUIOXANE; OPTICAL ACTIVITY; PLANAR CHIRAL STRUCTURES (PCS); ROOM TEMPERATURE NANOIMPRINT LITHOGRAPHY (RTNIL);

ELECTRON BEAM LITHOGRAPHY;

EID: 14944374496     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.12.078     Document Type: Conference Paper

References (4)

1. A. Papakostas, A. Potts, D.M. Bagnall, S.L. Prosvirnin, H.J. Coles, and N.I. Zheludev Phys. Rev. Lett. 90 2003 107404
2. A. Potts, A. Papakostas, D.M. Bagnall, and N.I. Zheludev Micro. Nano Eng. 73-74 2003 367
3. Y. Chen, Kaiwu Peng, and Zheng Cui Micro. Nano Eng. 73-74 2003 278
4. Jiarui Tao, Yifang Chen, Xingzhong Zhao and Zheng Cui, in: The International Conference of Micro- and Nano Engineering, Rotterdam, The Netherlands, 2005 (this issue)