Study of pattern placement error by thermal expansions in nanoimprint lithography

Journal of Microlithography, Microfabrication and Microsystems

Volumn 5, Issue 1, 2006, Pages

  Chen, Yifang ^a   Tao, Jiarui ^a,b   Zhao, Xingzhong ^b   Cui, Zheng ^a  

^a RUTHERFORD APPLETON LABORATORY   (United Kingdom)

^b WUHAN UNIVERSITY   (China)

Author keywords

Electron beam lithography; Nanoimprint lithography; Pattern placement error; Thermal expansion

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ERROR ANALYSIS; SUBSTRATES; TEMPERATURE DISTRIBUTION; THERMAL EXPANSION;

HEAT CYCLE; NANOIMPRINT LITHOGRAPHY (NIL); PATTERN PLACEMENT ERROR; ROOM TEMPERATURE;

PHOTOLITHOGRAPHY;

EID: 33748563939     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2172991     Document Type: Article

References (7)

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