Transparent thin-film transistor exploratory development via sequential layer deposition and thermal annealing

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 2717-2721

  Hong, David ^a   Chiang, Hai Q ^a   Presley, Rick E ^a   Dehuff, Nicole L ^a   Bender, Jeffrey P ^a   Park, Cheol Hee ^b   Wager, John F ^a   Keszler, Douglas A ^b  

^a Oregon State University   (United States)

^b OREGON STATE UNIVERSITY   (United States)

Author keywords

Indium oxide; Sequential layer deposition; Tin oxide; Zinc indium oxide; Zinc oxide; Zinc tin oxide

Indexed keywords

ANNEALING; INDIUM COMPOUNDS; POSITIVE IONS; SPUTTERING; TIN COMPOUNDS; ZINC OXIDE;

CATION OXIDE LAYERS; SEQUENTIAL LAYER DEPOSITION; ZINC INDIUM OXIDE;

THIN FILM TRANSISTORS;

EID: 33750836707     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.03.050     Document Type: Article

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