Deposition and characterization of zinc oxide and tin oxide ultrafine particle bilayer thin films

Thin Solid Films

Volumn 345, Issue 2, 1999, Pages 212-216

  Wang, Wei ^a   Wang, Shengyue ^b   Pan, Xiaoren ^c  

^a HUAIBEI NORMAL UNIVERSITY   (China)

^b UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^c EAST CHINA UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; EVAPORATION; GASOLINE; PARTICLE SEPARATORS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING GLASS; SEMICONDUCTING TIN COMPOUNDS; SEMICONDUCTING ZINC COMPOUNDS; SEMICONDUCTOR GROWTH; THIN FILMS; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

ULTRAFINE PARTICLE BILAYER THIN FILMS;

SEMICONDUCTING FILMS;

EID: 0032647279     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01088-8     Document Type: Article

References (14)

1. Fleischer M., Meixner H. Sens. Actuators B. 43:1997;1.
2. Jenkins D.F.L., Cunningham M.J., Velu G., Remiens D. Sens. Actuators A. 63:1997;135.
3. Geatches R.M., Chadwich A.V., Wright J.D. Sens. Actuators B. 4:1991;467.
4. Yusheng S., Tiansu D. Sens. Actuators B. 12:1993;5.
5. Ducso C., Khanh N.Q., Horrath Z., et al. J. Electrochem. Soc. 143:1996;683.
6. Robertson J. Phys. Rev. B. 30:1984;3520.
7. Obayashi H., Kudo T. Jpn. J. Appl. Phys. 14:1975;330.
8. Vlachos D.S., Papadopoulos C.A., Avaritsiotis J.N. Sens. Actuators B. 44:1997;458.
9. Ogawa H., Abe A., Nishikawa M., Hayakawa S. J. Electrochem. Soc. 128:1981;685.
10. Kobayashi T., Haruta M., Sano H., Hahane M. Sens. Actuators. 13:1988;339.
11. Yuancheng L., Xiaoren P. Vacuum. 43:1992;1071.
12. Yihua Z., Hui L., Yuancheng L., et al. Thin Solid Films. 224:1993;82.
13. P. Xiaoren, et al., Int. Symp. Vacuum Sci., Wuxi, China, 1991, p. 104.
14. Shengyue W., Jiazhen H., Yuancheng L., Xiaoren P. Vacuum Sci. Technol. (China). 15:1995;215.