Platform-dependent properties of 193nm single layer resists

Journal of Photopolymer Science and Technology

Volumn 11, Issue 3, 1998, Pages 475-481

  Allen, Robert D ^a   Wallow, Thomas I ^a   Opitz, Juliann ^a   Larson, Carl ^a   Dipietro, Richard A ^a   Sooriyakumaran, Ratnam ^a   Brock, Phillip ^a   Breyta, Greg ^a   Hofer, Donald C ^a   Jayaraman, Saikumar ^b   Vicari, Richard ^b   Hullihen, Karen A ^b   Rhodes, Larry F ^b   Goodall, Brian L ^b   Shick, Robert A ^b  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b BFGoodrich Co   (United States)

Author keywords

193nm resists; Acrylics; Cyclic olefins; Etch resistance; Polymer chemistry

Indexed keywords

EID: 0000799228     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.11.475     Document Type: Article

References (16)

1. R. D. Allen, W. E. Conley, and R. R. Kunz, "Deep-UV Resist Technology," Clip. 4 in Handbook of Microlithography, Ed. P. Rai-Choudhury, SPIE Press, 1997.
2. R. Allen, R. Sooriyakumaran, J. Opitz, G. Wallraff, R. DiPietro, G. Breyta, D. Hofer, R. Kunz, U. Okoroanyanwu, C. G. Willson, Jo. Photopolym. Sei. Technol., 9(1996) 465.
3. R. Allen, et al., J. Photopolym. Sei. Technol., 10(1997), 503.
4. T. Wallow, et al., Proc. SPIE, 3333 (1998) in press.
5. U. Okoroanyanwu, T. Shimokawa, J. Byers, D. Medeiros, C. G. Willson, Q. Niu, J. Frechet, R. Allen, Proc. SPIE, 3049(1997), 92.
6. T. Wallow, F. Houlihan, O. Nalamasu, E. Chandross, T. Neenan and E. Reichmanis, Proc. SPIE, 2724(1996), 355.
7. F. Houlihan, T. Wallow, A. Timko, E. Neria, R. Hutton, R. Cirelli, O. Nalamasu, and E. Reichmanis, Proc. SPIE, 3049(1997) 84; K. Patterson, U. Okoroanyanwu, T. Shimokawa, S. Cho, J. Byers, C. G. Willson, Proc. SPIE, 3333 (1998) in press.
8. J. V. Crivello and S-Y. Shim, Chem. Mater., 8(1996) 376.
9. J. Jung, C. Bok, and K. Baik, Jo. Photopolym. Sei. Technol., 10(1997) 529.
10. R. Allen, R. Sooriyakumaran, J. Opitz, G. Wallraff, R. DiPietro, G. Breyta, D. Hofer, R. Kunz, S. Jayaraman, R. Shick, B. Goodall, U. Okoroanyanwu, C. G. Willson, Proc. SPIE, 2724(1996), 334.
11. R. -Allen, et al., Proc. SPIE, 3333 (1998), in press; J. Opitz, R. Allen, T. Wallow, D. Hofer, Proc. SPIE, 3333 (1998), in press.
12. R. Allen, I. Wan, G. Wallraff, R. DiPietro, D. Hofer, and R. Kunz, J. Photopolym. Sei. Technol., 8(1995), 623.
13. K. Nozaki, K. Watanabe, E. Yano, A. Kotachi, S. Takechi, and I. Hanyu, J. Photopolym. Sei. Technol. 9(1996), 509.
14. R. Allen, G. Wallraff, W. Hinsberg, L. Simpson, J. Vac. Sei. Tech., B9(1991) 3357; R. Allen, G. Wallraff, W. Hinsberg, L. Simpson, and R. Kunz, ACS Symposium Series 537, Clip. 11, Ed. L. Thompson, G. Willson and S. Tagawa, American Chemical Society, (1994); R. Allen, et al., Proc. SPIE, 1925(1993), 246.; R. Kunz, R. Allen, G. Wallraff, W. Hinsberg, Proc. SPIE, 1925(1993), 167.
15. H. Ito, et al., Proc. SPIE, 2438(1995), 53.
16. M. Suwa, T. Kajita, H. Iwasawa, M. Yamamoto, and S. Iwanaga, Proc. SPIE, 3333 (1998) in press.