Fabrication of n-type 4H-SiC/Ni junctions using electrochemical deposition

Applied Physics Letters

Volumn 76, Issue 10, 2000, Pages 1300-1302

  Oskam, G ^a   Searson, P C ^a   Cole, M W ^b  

^a Johns Hopkins University   (United States)

^b U S ARMY RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001022577     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.126015     Document Type: Article

References (24)

1. J. B. Casady and R. W. Johnson, Solid-State Electron. 39, 1409 (1996).
2. T. P. Chow and M. Ghezzo, Mater. Res. Soc. Symp. Proc. 423, 9 (1996).
3. M. R. Melloch and J. A. Cooper, Jr., MRS Bull., 42 (1997).
4. J. Crofton, P. G. McMullin, J. R. Williams, and M. J. Bozack, J. Appl. Phys. 77, 1317 (1995).
5. M. J. Bozack, Phys. Status Solidi B 202, 549 (1997).
6. M. W. Cole, C. Hubbard, C. G. Fountzoulas, D. Demaree, A. Natarajan, R. A. Miller, D. Zhu, and K. Xie, Electrochem. Solid-State Lett. 2, 97 (1999).
7. A. Kakanakova-Georgieva, Ts. Marinova, O. Noblanc, C. Arnodo, S. Cassette, and C. Brylinski, Thin Solid Films 343-344, 637 (1999).
8. K. J. Schoen, J. M. Woodall, J. A. Cooper, Jr., and M. R. Melloch, IEEE Trans. Electron Devices 45, 1595 (1998).
9. P. C. Andricacos and N. Robertson, IBM J. Res. Dev. 42, 671 (1998).
10. D. Edelstein, J. Heidenreich, R. Goldblatt, W. Cote, C. Uzoh, N. Lustig, P. Roper, T. McDevitt, W. Motsiff, A. Simon, J. Dukovic, R. Wachnik, H. Rathore, R. Schulz, L. Su, S. Luce, and J. Slattery, Proc. IEEE 43, 773 (1997).
11. G. Oskam, J. G. Long, A. Natarajan, and P. C. Searson, J. Phys. D: Appl. Phys. 31, 1927 (1998).
12. G. Oskam, D. van Heerden, and P. C. Searson, Appl. Phys. Lett. 73, 3241 (1998).
13. G. Oskam, L. Bart, D. Vanmaekelbergh, and J. J. Kelly, J. Appl. Phys. 74, 3238 (1993).
14. G. Oskam, D. Vanmaekelbergh, and J. J. Kelly, Electrochim. Acta 38, 1115 (1993).
15. J. van de Lagemaat, D. Vanmaekelbergh, and J. J. Kelly, J. Appl. Phys. 83, 6089 (1998).
16. A. J. Arvia and D. Posadas, in Standard Potentials in Aqueous Solutions, edited by A. J. Bard, R. Parsons, and J. Jordan (Marcel Dekker, New York, 1985), p. 321.
17. Southampton Electrochemistry Group, Instrumental Methods in Electrochemistry (Ellis Horwood, New York, 1990).
18. B. R. Scharifker and G. J. Hills, Electrochim. Acta 28, 879 (1983).
19. G. Oskam, P. M. Vereecken, and P. C. Searson, J. Electrochem. Soc. 146, 1436 (1999).
20. E. H. Rhoderick and R. H. Williams, Metal-Semiconductor Contacts (Oxford University Press, New York, 1988).
21. L. M. Porter and R. F. Davis, Mater. Sci. Eng., B 34, 83 (1995).
22. A. Bächli, M.-A. Nicolet, L. Baud, C. Jaussaud, and R. Madar, Mater. Sci. Eng., B 56, 11 (1998).
23. J. Crofton, L. M. Porter, and J. R. Williams, Phys. Status Solidi B 202, 581 (1997).
24. T. W. Haas, J. T. Grant, and G. J. Dooley III, J. Appl. Phys. 43, 1853 (1972).