Interfacial reaction and adhesion between SiC and thin sputtered nickel films

Journal of Materials Science

Volumn 32, Issue 24, 1997, Pages 6567-6572

  Lim, C S ^a,b   Nickel, H ^a   Naoumidis, A ^a   Gyarmati, E ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ANNEALING; CERAMIC MATERIALS; CHEMICAL REACTIONS; INTERFACES (MATERIALS); MICROSCOPIC EXAMINATION; SILICON CARBIDE; SILICON COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

CERAMIC METAL INTERFACIAL REACTIONS; SILICIDES;

NICKEL;

EID: 0031343251     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1018623613741     Document Type: Article

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