Nickel based ohmic contacts on SiC

Materials Science and Engineering B

Volumn 46, Issue 1-3, 1997, Pages 223-226

  Marinova, Ts ^a   Kakanakova Georgieva, A ^a   Krastev, V ^a   Kakanakov, R ^b   Neshev, M ^b   Kassamakova, L ^b   Noblanc, O ^c   Arnodo, C ^c   Cassette, S ^c   Brylinski, C ^c   Pecz, B ^d   Radnoczi, G ^d   Vincze, Gy ^d  

^a BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

^b Central Laboratory of Applied Physics Bulgarian Academy of Sciences   (Bulgaria)

^c THALES   (France)

^d INSTITUTE OF EXPERIMENTAL MEDICINE   (Hungary)

Author keywords

Nickel contact; Ohmic contact; Silicon carbide

Indexed keywords

DIFFUSION IN SOLIDS; DISSOCIATION; ELECTRIC RESISTANCE MEASUREMENT; MORPHOLOGY; MULTILAYERS; NICKEL; PYROLYSIS; SILICON CARBIDE; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY;

CONTACT FORMATION; KIRKENDALL VOIDS;

OHMIC CONTACTS;

EID: 0042726963     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(96)01981-2     Document Type: Article

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