Nickel film on (001) SiC: Thermally induced reactions

Materials Science and Engineering B

Volumn 56 B56, Issue 1, 1998, Pages 11-23

  Bachli A ^a   Nicolet, M A ^a   Baud, L ^b   Jaussaud, C ^b   Madar, R ^c  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^b CEA LETI   (France)

^c Grenoble INP Phelma   (France)

Author keywords

Film; Nickel; Reaction

Indexed keywords

ANNEALING; CRYSTALLINE MATERIALS; NICKEL; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SILICON CARBIDE; SINGLE CRYSTALS; THERMAL EFFECTS; THERMOANALYSIS; THERMODYNAMIC STABILITY; VACUUM FURNACES; X RAY DIFFRACTION ANALYSIS;

BACKSCATTERING SPECTROMETRY;

SEMICONDUCTING FILMS;

EID: 0032475657     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0921-5107(98)00204-9     Document Type: Article

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