Sustained polymer membranes fabricated by nanoimprint lithography

Journal of Microlithography, Microfabrication and Microsystems

Volumn 5, Issue 1, 2006, Pages

  Schift, Helmut ^a   Bellini, Sandro ^b   Pieles, Uwe ^b   Gobrecht, Jens ^a,b  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b UNIVERSITY OF APPLIED SCIENCES AND ARTS NORTHWESTERN SWITZERLAND   (Switzerland)

Author keywords

Lift off resist; Membrane; Nanoimprint lithography; Sacrificial layer; Support column; Thermoplastic polymer

Indexed keywords

ARRAYS; LAYERED MANUFACTURING; MICROMETERS; PHOTOLITHOGRAPHY; SUBSTRATES;

LIFT OFF RESIST; NANOIMPRINT LITHOGRAPHY; SACRIFICIAL LAYER TECHNIQUE; SUBMICROSTRUCTURES; THERMOPLASTIC POLYMER;

POLYMERIC MEMBRANES;

EID: 33748580653     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2172993     Document Type: Article

References (28)

1. C. J. M. van Rijn, G. J. Veldhuis, and S. Kuiper, "Nanosieves with microsystem technology for microfiltration applications," NanotechnologyV, 343-345 (1998).
2. S. J. McNab, N. Moll, and Y. A. Vlasov, "Ultra-low loss photonic integrated circuit with membrane-type photonic crystal waveguides," Opt. Express 11(22), 2927-2939 (2003).
3. J. Brugger, J. M. Berenschot, S. Kuiper, W. Nijdam, B. Otter, and M. Elwenspoek, "Resistless patterning of sub-micron structures by evaporation through nanostencils," Microelectron. Eng. 53, 403-405 (2000).
4. "Millicell cell culture plate inserts," Millipore Corp. Bedford, MA, see http://www.millipore.com.
5. J. M. Köhler, G. Mayer, S. Poser, T. Schulz, and A. Schober, "Chip elements for combinatorial chemistry, fluid processing and PCR, " Proc. Micro System Technol. H. Reichl and A. Heuberger, Eds., 693-698, VDE-Verlag, Berlin (1996).
6. E. E. Leary Swan, K. C. Popat, C. A. Grimes, and T. A. Desai, "Fabrication and evaluation of nanoporous alumina membranes for osteoblast culture," J. Biomed. Mater. Res. 72A, 288-295 (2005).
7. L. J. Heyderman, B. Ketterer, D. Bächle, F. Glaus, B. Haas, H. Schift, K. Vogelsang, J. Gobrecht, L. Tiefenauer, O. Dubochet, P. Surbled, and T. Hessler, "High volume fabrication of customised nanopore membrane chips," Microelectron. Eng. 67,68, 208-213 (2003).
8. A. Hierlemann, O. Brand, C. Hagleitner, and H. Baltes, "Microfabrication techniques for chemical/biosensors," Proc. IEEE 91(6), 839 (2003).
9. S. Metz, C. Trautmann, A. Bertsch, and P. Renaud, "Polyimide microfluidic devices with integrated nanoporous filtration areas manufactured by micromachining and ion track technology," J. Micromech. Microeng. 14, 324-331 (2004).
10. D. Nilsson, S. Balslev, and A. Kristensen, "A microfluidic dye laser fabricated by nanoimprint lithography in a highly transparent and chemically resistant cyclo-olefin copolymer (COC)," J. Micromech. Microeng. 15, 296-300 (2005).
11. M. T. Gale, "Replication," in Micro-Optics, H. P. Herzig, Ed., Taylor & Francis, London (1997).
12. M. Heckele and W. K. Schomburg, "Review on micro molding of thermoplastic polymers," J. Micromech. Microeng. 14, R1-R14 (2004).
13. H. Schift, J. Gobrecht, B. Satilmis, J. Söchtig, F. Meier, and W. Raupach, "Nanoreplication in a Network," Kunststoffe Plast Europe 94, 1-4 (2004).
14. R. W. Jaszewski, H. Schift, J. Gobrecht, and P. Smith, "Hot embossing in polymers as a direct way to pattern resist," Microelectron. Eng. 41,42, 575-578 (1998).
15. S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo, and L. Zhuang, "Sub-10 nm imprint lithography and applications," J. Vac. Sci. Technol. B 15(6), 2897-2904 (1997).
16. "Alternative lithography - Unleashing the potential of nanotechnology," in Nanostructure Science and Technology, C. Sotomayor Torres, Ed., pp. 46-76, Kluwer Academic/Plenum Publishers, ISBN 0-306-47858-7 (2003).
17. L. J. Guo, "Recent progress in nanoimprint technology and its applications," J. Phys. D 37, R123-R141 (2004).
18. Y. Chen, K. Peng, and Z. Cui, "A lift-off process for high resolution patterns using PMMA/LOR resist stack," Microelectron. Eng. 73,74, 278-281 (2004).
19. P. Carlberg, M. Graczyk, E. L. Sawe, I. Maximov, M. Beck, and L. Montelius, "Lift-off process for nanoimprint lithography," Microelectron. Eng. 67,68, 203-207 (2003).
20. "LOR data sheets," Microchem™, see http://www.microchem.com/products/lor.htm (Feb. 2005).
21. H. Schulz, M. Wissen, and H. C. Scheer, "Local mass transport and its effect on global pattern replication during hot embossing," Microelectron. Eng. 67,68, 657-663 (2003).
22. T. Borzenko, M. Tonnen, G. Schmidt, and L. W. Molenkamp, "Polymer bonding process for nanolithography," Appl. Phys. Lett. 79(14), 2246-2248 (2001).
23. X. D. Huang, L. R. Bao, X. Cheng, L. J. Guo, S. W. Panga, and A. F. Yee, "Reversal imprinting by transferring polymer from mold to substrate," J. Vac. Sci. Technol. B 20(6), 2872-2876 (2002).
24. W. Li, J. O. Tegenfeldt, L. Chen, R. H. Austin, S. Y. Chou, P. A. Kohl, J. Krotine, and J. C. Sturm, "Sacrificial polymers for nanofluidic channels in biological applications," Nanotechnology 14, 1-6 (2003).
25. R. R. Panepucci, B. H. Kim, V. R. Almeida, and M. D. Jones, "Photonic crystals in polymers by direct electron-beam lithography presenting a phonic band gap," J. Vac. Sci. Technol. B 22(6), 3348-3351(2004).
26. H. Schift, S. Park, C. G. Choi, C. S. Kee, S. P. Han, K. B. Yoon, and J. Gobrecht, "Fabrication process for polymer photonic crystals using nanoimprint lithography," Nanotechnology 16, S261-S265 (2005).
27. L. J. Guo, X. Cheng, and C. F. Chou, "Fabrication of size-controllable nanofluidic channels by nanoimprinting and its application for DNA stretching," Nano Lett. 4, 69-73 (2004).
28. H. Schift, R. W. Jaszewski, C. David, and J. Gobrecht, "Nanostructuring of polymers and fabrication of interdigitated electrodes by hot embossing lithography," Microelectron. Eng. 46, 121-124 (1999).