Fabrication of polymer photonic crystals using nanoimprint lithography

Nanotechnology

Volumn 16, Issue 5, 2005, Pages

  Schift, Helmut ^a   Park, Sunggook ^a,d   Jung, Bokyung ^a   Choi, Choon Gi ^b   Kee, Chul Sik ^c   Han, Sang Pil ^b   Yoon, Keun Byoung ^b   Gobrecht, Jens ^a  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

^c Gwangju Institute of Science and Technology (GIST)   (South Korea)

^d LOUISIANA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ELECTRON BEAM LITHOGRAPHY; NANOTECHNOLOGY; OPTIMIZATION; PHOTONS; POLYMETHYL METHACRYLATES; RHEOLOGY; THIN FILMS;

NANOIMPRINT LITHOGRAPHY (NIL); NANORHEOLOGICAL BEHAVIOURS; POLYMER PHOTONIC CRYSTALS; POLYMERIC PHOTONIC BAND GAP STRUCTURES;

BAND STRUCTURE;

EID: 24144477520     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/16/5/023     Document Type: Conference Paper

References (10)

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