EUV mask process development and integration

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6283 I, Issue , 2006, Pages

  Zhang, Guojing ^a   Yan, Pei Yang ^a   Liang, Ted ^a   Du, Yan ^a   Sanchez, Peter ^a   Park, Seh Jin ^a   Lanzendorf, Eric J ^a   Choi, Chang Ju ^a   Shu, Emily Y ^a   Stivers, Alan R ^a   Farnsworth, Jeff ^a   Hsia, Kangmin ^a   Chandhok, Manish ^a   Leeson, Michael J ^a   Vandentop, Gilroy ^a  

^a INTEL CORPORATION   (United States)

Author keywords

EUV lithography; EUV mask; Integration

Indexed keywords

DRY ETCHING; LITHOGRAPHY; OPTIMIZATION; SILICON WAFERS; TANTALUM; ULTRAVIOLET RADIATION;

ABSORBER FILM DEPOSITION; EUV LITHOGRAPHY; EXTREME ULTRAVIOLET (EUV) MASK;

MASKS;

EID: 33748045814     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681839     Document Type: Conference Paper

References (18)

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