EUV mask absorber characterization and selection

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4066, Issue , 2000, Pages 116-123

  Yan, Pei yang ^a   Zhang, Guojing ^a   Kofron, Patrick ^a   Powers, Jeff ^a   Tran, Mark ^a   Liang, Ted ^a   Stivers, Alan ^a   Lo, Fu Chang ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CLEANING; DEFECTS; ETCHING; FABRICATION; INSPECTION; LIGHT ABSORPTION; MECHANICAL PROPERTIES; METALLIC FILMS; OPTICAL PROPERTIES; PHOTOLITHOGRAPHY; SUBSTRATES; THERMODYNAMIC PROPERTIES;

ABSORBER; CRITICAL DIMENSION CONTROL; DEFECT CONTROL; EXTREME ULTRAVIOLET LITHOGRAPHY; FILM EMISSIVITY; FILM STRESS; MASK PATTERNING;

MASKS;

EID: 0033671568     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.392025     Document Type: Conference Paper

References (3)