Silicon surface morphology study after exposure to tailored femtosecond pulses

Applied Surface Science

Volumn 252, Issue 20, 2006, Pages 7449-7460

  Hommes, V ^a   Miclea, M ^a   Hergenroder R ^a  

^a LEIBNIZ INSTITUT FÜR ANALYTISCHE WISSENSCHAFTEN ISAS E V   (Germany)

Author keywords

Crater morphology; Femtosecond laser ablation; Pulse shaping; Silicon

Indexed keywords

ATMOSPHERIC PRESSURE; LASER ABLATION; SILICON; SINGLE CRYSTALS; SURFACE STRUCTURE;

CRATER MORPHOLOGY; FEMTOSECOND LASER ABLATION; PULSE SHAPING;

LASER PULSES;

EID: 33747200171     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.08.089     Document Type: Article

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