Thermal transport in melting and recrystallization of amorphous and polycrystalline Si thin films

Applied Physics A: Materials Science and Processing

Volumn 69, Issue 7, 1999, Pages

  Grigoropoulos, C P ^a   Moon, S ^a   Lee, M ^a   Hatano, M ^a,b   Suzuki, K ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001509879     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390051403     Document Type: Article

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