Laser ablation thresholds of silicon for different pulse durations: Theory and experiment

Applied Surface Science

Volumn 197-198, Issue , 2002, Pages 839-844

  Jeschke, Harald O ^a   Garcia, Martin E ^a   Lenzner, Matthias ^b   Bonse, Jörn ^b   Krüger, Jörg ^b   Kautek, Wolfgang ^b  

^a FREIE UNIVERSITÄT BERLIN   (Germany)

^b BAM FEDERAL INSTITUTE FOR MATERIALS RESEARCH AND TESTING   (Germany)

Author keywords

Laser ablation; Pulse duration; Threshold of silicon

Indexed keywords

COMPUTER SIMULATION; LASER PULSES; MELTING; MICROSCOPIC EXAMINATION; MOLECULAR DYNAMICS; SILICON; ULTRAFAST PHENOMENA;

PULSE DURATIONS;

LASER ABLATION;

EID: 0036423947     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)00458-0     Document Type: Conference Paper

References (23)

1. J.S. Horwitz, H.-U. Krebs, K. Murakami, M. Stuke (Eds.), Proceedings of the Fifth International Conference on the Laser Ablation, Goettingen, 1999, Appl. Phys. A Mater. Sci. Process. 69 (1999) S1-S952.
2. Krüger J., Kautek W., Laser Phys. 9 1999 30.
3. K. Sokolowski-Tinten, J. Bialkowski, D. von der Linde, Phys. Rev. B 51 (1995) 14186, and references therein.
4. D. Bäuerle, Laser Processing and Chemistry, 3rd Edition, Springer, Heidelberg, Berlin, 2000.
5. Liu P.L., Yen R., Bloembergen N., Hodgson R.T., Appl. Phys. Lett. 34 1979 864.
6. Higashi S., Sameshima T., Jpn. J. Appl. Phys. 40 2001 480.
7. Shank C.V., Yen R., Hirlimann C., Phys. Rev. Lett. 50 1983 454.
8. Cavalleri A., Sokolowski-Tinten K., Bialkowski J., Schreiner M., van der Linde D., J. Appl. Phys. 85 1999 3301.
9. Fauchet P.M., Siegman A.E., Appl. Phys. Lett. 40 1982 824.
10. Giust G.K., Sigmona T.W., Appl. Phys. Lett. 70 1997 3552.
11. Her T.H., Finlay R.J., Wu C., Deliwala S., Mazur E., Appl. Phys. Lett. 73 1998 1673.
12. Pedraza A.J., Fowlkes J.D., Lowndes D.H., Appl. Phys. Lett. 77 2000 3018.
13. Herrmann R.F.W., Gerlach J., Campbell E.E.B., Appl. Phys. A 66 1998 35.
14. H.O. Jeschke, M.E. Garcia, K.H. Bennemann, Phys. Rev. B 60 (1999) R3701.
15. H.O. Jeschke, M.E. Garcia, K.H. Bennemann, Phys. Rev. Lett. 87 (2001) 015003.
16. Jeschke H.O., Garcia M.E., Bennemann K.H., Appl. Phys. A 69 1999 49.
17. Parrinello M., Rahman A., J. Appl. Phys 52 1981 7182.
18. Verlet L., Phys. Rev. 159 1967 98.
19. J.M. Haile, Molecular Dynamics Simulation: Elementary Methods, Wiley, New York, 1975.
20. Lenzner M., Spielmann Ch., Wintner E., Krausz F., Schmidt A.J., Opt. Lett. 20 1995 1397.
21. Liu J.M., Opt. Lett. 7 1982 196.
22. H.O. Jeschke, M.E. Garcia, K.H. Bennemann, cond-mat/0107230.
23. Work in this direction is in progress.