Nitrogen plasma pressure influence on the composition of TiNxOy sputtered films

Surface and Interface Analysis

Volumn 33, Issue 7, 2002, Pages 577-582

  Guillot, J ^a   Jouaiti, A ^b   Imhoff, L ^a   Domenichini, B ^a   Heintz, O ^a   Zerkout, S ^c   Mosser, A ^d   Bourgeois, S ^a  

^a UNIVERSITÉ DE BOURGOGNE   (France)

^b SULTAN MOULAY SLIMANE UNIVERSITY   (Morocco)

^c Universite Mentouri Constantine   (Algeria)

^d INSTITUT DE PHYSIQUE ET CHIMIE DES MATÉRIAUX DE STRASBOURG   (France)

Author keywords

PVD; Thin film; TiNxOy; XPS

Indexed keywords

NITROGEN PLASMA PRESSURE; VACUUM CHAMBER;

CRYSTALLINE MATERIALS; GLASS; MAGNETRON SPUTTERING; NITROGEN; OXYGEN; PARTIAL PRESSURE; PHYSICAL VAPOR DEPOSITION; PLASMAS; SECONDARY ION MASS SPECTROMETRY; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

THIN FILMS;

EID: 0036639418     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1423     Document Type: Article

References (32)