Conductimetry and impedance spectroscopy study of low pressure metal organic chemical vapor deposition TiN x O y films as a function of the growth temperature: A percolation approach

Applied Surface Science

Volumn 175-176, Issue , 2001, Pages 574-578

  Fabreguette, F ^a,b   Maglione, M ^a   Imhoff, L ^b   Domenichini, B ^b   Marco De Lucas, M C ^b   Sibillot, P ^a   Bourgeois, S ^b   Sacilotti, M ^a  

^a UNIVERSITÉ DE BOURGOGNE   (France)

^b LABORATOIRE INTERDISCIPLINAIRE CARNOT DE BOURGOGNE   (France)

Author keywords

Conductimetry; Electrical behaviour; Impedance spectroscopy; Percolation; TiN x O y

Indexed keywords

ELECTRIC CONDUCTIVITY OF SOLIDS; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PERCOLATION (SOLID STATE); SPECTROSCOPY; THERMAL EFFECTS; THIN FILMS;

CONDUCTIMETRY; IMPEDANCE SPECTROSCOPY; TITANIUM OXINITRIDE;

TITANIUM NITRIDE;

EID: 0035873764     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00121-0     Document Type: Article

References (22)

1. Staia M.H., Cervantes C., Viloria S. Surf. Coat. Technol. 72:1995;145.
2. Buiting M.J., Oterloo A.F., Montree A.H. J. Electrochem. Soc. 138:1991;500.
3. Schintlmeister W., Pacher O., Pfaffinger K. J. Electrochem. Soc. 123:1976;924.
4. Cho J., Nam S., Chun J. J. Mater. Sci. 17:1982;2495.
5. Wittmer M. J. Vac. Sci. Technol. A. 3:1985;1797.
6. Tada H., Saito Y., Hirata M., Kawahara H. J. Appl. Phys. 73:1993;489.
7. Lazarov M., Raths P., Metzger H., Spirkl W. J. Appl. Phys. 77:1995;2133.
8. Oyama T., Ohsaki H., Tachibana Y., Hayashi Y., Ono Y., Horie N. Thin Solid Films. 351:1999;235.
9. Bittar A., Cochrane D., Caughley S., Vickeridge I. J. Vac. Sci. Technol. A. 15:1997;223.
10. Fabreguette F., Imhoff L., Maglione M., Domenichini B., Marco de Lucas M.C., Sibillot P., Bourgeois S., Sacilotti M. Chem. Vap. Deposition. 6:2000;109.
11. Ph. Babelon, Ph.D. Thesis, Université de Bourgogne, 1997.
12. P. Sibillot, P. Babelon, M. Sacilotti, S. Bourgeois, French Patent 9,713,043 (1997).
13. van der Pauw L.J. Philips Res. Rep. 13:1958;1.
14. Fabreguette F., Imhoff L., Guillot J., Domenichini B., Marco de Lucas M.C., Sibillot P., Bourgeois S., Sacilotti M. Surf. Coat. Technol. 125:2000;396.
15. J. Guillot, F. Fabreguette, L. Imhoff, O. Heintz, M.C. Marcode Lucas, M. Sacilotti, B. Domenichini, S. Beurgeouis, Appl. Surf. Sci., in press.
16. Last B.J., Thouless D.J. Phys. Rev. Lett. 27:1971;1719.
17. McLachlan D.S., Blaskiewicz M., Newnham R.F. J. Am. Ceram. Soc. 73:1990;2187.
18. Nan C.W. Prog. Mater. Sci. 37:1993;1.
19. Halperin B.I., Feng S., Sen P.N. Phys. Rev. Lett. 54:1985;2391.
20. F. Fabreguette, M. Maglione, J.P. Clerc, S. Beurgeouis, M. Sacilotti, submitted.
21. Smith L.N., Lobb C.J. Phys. Rev. B. 20:1979;3653.
22. A.K. Jonscher, Dielectric Relaxation in Solids, Chelsea Dielectrics Press, London, 1983.