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Volumn 21, Issue 14, 2005, Pages 6366-6372

Oxygen plasma-treatment effects on Si transfer

Author keywords

[No Author keywords available]

Indexed keywords

CHAMBER PRESSURE; MICROCONTACT PRINTING; PLASMA TREATMENTS; POLAR SOLVENTS;

EID: 22444438180     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la046795v     Document Type: Article
Times cited : (52)

References (68)
  • 56
    • 22444448163 scopus 로고    scopus 로고
    • Unpublished results
    • Unpublished results.
  • 63
    • 22444436450 scopus 로고    scopus 로고
    • Hippler, R., Pfau, S., Schmidt, M., Schoenbach, K. H., Eds.; Wiley-VCH: Berlin
    • Kersten, H. In Low-temperature plasma physics; Hippler, R., Pfau, S., Schmidt, M., Schoenbach, K. H., Eds.; Wiley-VCH: Berlin, 2001; pp 113-130.
    • (2001) Low-temperature Plasma Physics , pp. 113-130
    • Kersten, H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.