Generation of 30-50 nm structures using easily fabricated, composite PDMS masks

Journal of the American Chemical Society

Volumn 124, Issue 41, 2002, Pages 12112-12113

  Odom, Teri W ^a   Thalladi, Venkat R ^a   Love, J Christopher ^a   Whitesides, George M ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIMETICONE;

ARTICLE; CHEMICAL ANALYSIS; CHEMICAL STRUCTURE; COMPOSITE MATERIAL; MATERIALS TESTING;

EID: 0037120834     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja0209464     Document Type: Article

References (14)

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3. Smith, H. I.; Spears, D. L.; Bernacki, S. E. J. Vac. Sci. Technol. 1973, 913-917. Crommie, M. F.; Lutz, C. P.; Eigler, D. M. Science 1993, 262, 218-219. Snow, E. S.; Campbell, P. M. Science 1995, 1639-1641.
4. Smith, H. I.; Spears, D. L.; Bernacki, S. E. J. Vac. Sci. Technol. 1973, 913-917. Crommie, M. F.; Lutz, C. P.; Eigler, D. M. Science 1993, 262, 218-219. Snow, E. S.; Campbell, P. M. Science 1995, 1639-1641.
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9. Shipley 1805 photoresist produced circular posts (100-250 nm in diameter) with dimensions smaller than AZ 5206 photoresist (350-400 nm in diameter).
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12. Structures of this size (250-350 nm) in metal should act as band-pass filters in the near-IR (1.8-3 μm). We observe, however, little or no increase in the transmission of light through these slots: Spector, S, J.; Astolfi, D. K.; Doran, S. P.; Lyszczarz, T. M.; Raynolds, J. E. J. Vac. Sci. Technol. 2001, 19, 2757-2760.
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