Development of polysiloxane electron beam resist for optical elements

Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals

Volumn 406, Issue PART 2, 2003, Pages

  Sakurai, Yoshiaki ^a   Satoh, Kazuo ^a   Fukuda, Hiroki ^a   Yotsuya, Tsutom ^b  

^a OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE   (Japan)

^b OSAKA SCIENCE AND TECHNOLOGY CENTER   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BITMAP IMAGES; CGH; COMPUTER-GENERATED HOLOGRAMS; DIFFRACTIVE OPTICAL ELEMENTS (DOE);

ALGORITHMS; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; FOURIER TRANSFORMS; GLASS; HELIUM NEON LASERS; HOLOGRAMS; OPTICAL DEVICES; PHASE MODULATION; SENSITIVITY ANALYSIS; SUBSTRATES;

SILICONES;

EID: 12844283881     PISSN: 1058725X     EISSN: None     Source Type: Journal    
DOI: 10.1080/15421400390257755     Document Type: Conference Paper

References (5)

1. Kley, E. B. & Tunnermann, A., Optical surfaces fabricated by the use of e-beam lithography and their applications. Proceedings of 8th microoptics conference 2001, The Japan Society of Applied Physics: 296-299.
2. Shiono, T., Hamamoto, T., & Takahara, K., High-efficiency blazed diffractive optical elements for violet wavelength fabricated by electron-beam lithography. Proceedings of 8th microoptics conference 2001, The Japan Society of Applied Physics: 300-303.
3. Yu, W., Takahara, K., Konishi, T., Yotsuya, T., & Ichioka, Y. (2000). Fabrication of multilevel phase computer-generated hologram elements based on effective medium theory. Appl. Opt., 39, 3531-3536.
4. Japan Chemical Society: Shin Jikken Kagaku Koza 29, Kobunshizairyo. Tokyo: Maruzen: 1993; 205-212.
5. Kratschmer, E. (1981). Verification of a proximity effect correction program in electron beam lithography. J. Vac. Sci. Technol., 19, 1264-1268.