Force curve measurements with the AFM: Application to the in situ determination of grafted silicon-wafer surface energies

Journal of Adhesion

Volumn 82, Issue 7, 2006, Pages 649-669

  Noel, Olivier ^a,b   Awada, Houssein ^a   Castelein, Gilles ^a   Brogly, Maurice ^a   Schultz, Jacques ^a  

^a INSTITUT DE CHIMIE DES SURFACES ET INTERFACES   (France)

^b UNIVERSITÉ DU MAINE   (France)

Author keywords

Adhesion; Atomic force microscopy; Calibration; Surface energy; Wetting

Indexed keywords

ATOMIC FORCE MICROSCOPY; CALIBRATION; IN SITU PROCESSING; INTERFACIAL ENERGY; SILICON WAFERS; WETTING;

FORCE CURVE MEASUREMENT; QUASI-STATIC MODE; SILICON-WAFER SURFACE ENERGIES;

ADHESION;

EID: 33745839685     PISSN: 00218464     EISSN: 15455823     Source Type: Journal    
DOI: 10.1080/00218460600775773     Document Type: Article

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