Mask defect printing mechanisms for future lithography generations

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 I, Issue , 2006, Pages

  Erdmann, Andreas ^a   Graf, Thomas ^a   Bubke, Karsten ^b   Höllein, Ingo ^b   Teuber, Silvio ^b  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

^b Advanced Mask Technology Center   (Germany)

Author keywords

Lithography simulation; Mask defect printability; Mask topography

Indexed keywords

COMPUTER SIMULATION; DEFECTS; ELECTROMAGNETIC FIELDS; MASKS;

ALTERNATING PHASE SHIFT MASKS (ALTPSM); LITHOGRAPHY SIMULATION; MASK DEFECT PRINTABILITY; MASK TOPOGRAPHY;

LITHOGRAPHY;

EID: 33745781673     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.655558     Document Type: Conference Paper

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