Mask defect printability at 0.18-um design rules for 193-nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 308-318

  Yan, Pei yang ^a   Tran, An ^a   Schmidt, Michael R ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; DESIGN; MASKS; PRINTING; PROCESS CONTROL; SEMICONDUCTOR DEVICE MANUFACTURE;

CRITICAL DIMENSIONS; OPTICAL MICROLITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0031353274     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)