Imaging properties of the extreme ultraviolet mask

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3444-3448

  Bollepalli, B S ^a   Khan, M ^a   Cerrina, F ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000947837     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590475     Document Type: Article

References (10)

1. C. Kunz, Synchrotron Radiation: Techniques and Applications (Springer, Berlin, 1979).
2. E. Spiller, Soft X-Ray Optics (Society of Photo Optical Instrument Engineering, Bellingham, WA, 1994).
3. J. Z. Y. Guo and F. Cerrina, IBM J. Res. Dev. 37, 331 (1993).
4. M. Born and E. Wolf, Principles Of Optics (Pergamon, New York, 1980).
5. D. T. Paris and F. K. Hurd, Basic Electromagnetic Theory (McGraw-Hill, New York, 1969).
6. E. Lalor, J. Opt. Soc. Am. 58, 1235 (1968).
7. B. L. Henke, E. M. Gullikson, and J. C. Davis, At. Data Nucl. Data Tables 54, 181 (1993).
8. B. S. Bollepalli, M. Khan, and F. Cerrina, MSM Conference Proceedings, Santa Clara, CA, 1998.
9. D. G. Stearns, R. S. Rosen, and S. P. Vernon, Appl. Opt. 32 (1993).
10. J. A. Stratton, Electromagnetic Theory (McGraw-Hill, New York, 1941).