Inspectability study of advanced photomasks with OPC structures

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4344, Issue 1, 2001, Pages 32-36

  Cross, Michael ^a   Bhattacharyya, Kaustuve ^b  

^a IBM MICROELECTRONICS   (United States)

^b KLA TENCOR CORPORATION   (United States)

Author keywords

Assist; Defect; Inspection; OPC; Serif

Indexed keywords

ALGORITHMS; DEFECTS; LASER APPLICATIONS; OPTICAL RESOLVING POWER; SENSORS; ULTRAVIOLET RADIATION;

OPTICAL PROXIMITY CORRECTIONS (OPC);

MASKS;

EID: 0034762588     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436799     Document Type: Article

References (0)