Alternating PSM phase defect printability for 100 nm KrF lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3998, Issue , 2000, Pages 308-320

  Kim, Juhwan ^a   Mo, Wang Pen ^a   Gordon, Ron ^a   Williams, Alvina ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL DEFECTS; MASKS; PRINTING; SCANNING; SCANNING ELECTRON MICROSCOPY;

PHASE DEFECT PRINTABILITY;

PHOTOLITHOGRAPHY;

EID: 0033690616     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)