Hidden CD errors due to reticle imperfection

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 2, 2001, Pages 888-897

  Ma, Z Mark ^a   Zheng, Sandra ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; ERROR DETECTION; IMAGE ENHANCEMENT; LIGHT TRANSMISSION; MASKS; OPTICAL DATA PROCESSING; OPTICAL RESOLVING POWER; PHASE SHIFT;

CRITICAL DIMENSIONS (CD) ERRORS; RESOLUTION ENHANCEMENT; RETICLE IMPERFECTIONS;

PHOTORESISTS;

EID: 0035758448     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.435790     Document Type: Conference Paper

References (3)

1. A.K Wong, R.A. Ferguson, L.W. Liebmann, S.M. Mansfield, A.F. Moless, and Mo. O. Neisier, "lithographic Effects, of Mask-Critical Dimension Errors", SPIE Proceedings, Vol. 3334, p. 106, (1998).
2. th Annual BACUS Symposium on Photomask Technology, SPIE Proceedings, Vol. 3873, p. 261 (1999).
3. Chris A. Mack, "Impact of Reticle Corner Rounding on Wafer Print Performance", Interface 200 Proceedings, (2000).