Inspection of Aggressive OPC Using Aerial Image-Based Mask Inspection

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5130, Issue , 2003, Pages 357-363

  Hsu, Luke T H ^a   Hung, Johnson C C ^a   Hsieh, H C ^a   Rosenbusch, Anja ^b   Falah, Reuven ^c   Blumberg, Yuval ^c  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

^b APPLIED MATERIALS INC   (United States)

^c Applied Materials Inc Israel   (Israel)

Author keywords

193nm technology; Aerial image based mask inspection; OPC; Optical Proximity Correction

Indexed keywords

COMPUTER SIMULATION; FABRICATION; IMAGE QUALITY; INSPECTION; INTEGRATED CIRCUITS; LIGHTING; OPTICAL SYSTEMS; PHOTOLITHOGRAPHY;

AERIAL-IMAGE BASED MASK INSPECTION; ALTERNATING PHASE SHIFTING MASKS (APSM); OPTICAL PROXIMITY CORRECTION (OPC); RESOLUTION ENHANCEMENT TECHNIQUES (RET);

MASKS;

EID: 1642514765     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504058     Document Type: Conference Paper

References (6)

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2. L. S. Zurbrick, J. P. Heumann, M. W. Rudzinski, S. E. Stokowski, J. Urbach, L. Wang, "New approaches to alternating phase-shift mask inspection", SPIE 4562, pp. 138-144, 2002
3. V. Philipsen, R. M. Jonkheere, S. Kohlpoth, A. Torres, "Defect printability for 100-nm design rule using 193nm lithography", SPIE 4754, pp. 639-650, 2002
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5. A. Rosenbusch, S. Hemar: "Inspecting Altrnating PSM by Matching Stepper Conditions", Presented at Bacus 2002
6. F. Chang at al: "Aerial image-based inspection of binary (Ope) and embedded-attenuated PSM", Presented at Bacus 2002