Defect printability for sub-0.18 um design rules using 193 nm lithography process and binary OPC reticle

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3998, Issue , 2000, Pages 773-780

  Phan, Khoi ^a   Spence, Chris ^a   Schefske, Jeff ^a   Okoroanyanwu, Uzodinma ^a   Levinson, Harry ^a  

^a One AMD Place   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; MASKS; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

OPTICAL PROXIMITY CORRECTION (OPC);

LITHOGRAPHY;

EID: 0033690601     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)