Wafer printability simulation accuracy based on UV optical inspection images of reticle defects

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3677, Issue II, 1999, Pages 711-720

  Pettibone, Donald ^a   Ananth, Mohan ^a   Rudzinski, Maciej ^a   Watson, Sterling ^a   Zurbrick, Larry ^a   Liu, Hua Yu ^a   Karklin, Linard ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CRYSTAL DEFECTS; MASKS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE TESTING; SILICON WAFERS; ULTRAVIOLET RADIATION;

ULTRAVIOLET OPTICAL INSPECTION SYSTEMS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032629251     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350857     Document Type: Conference Paper

References (6)