Organic monolayers covalently bonded to Si as ultra thin photoresist films in vacuum UV lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 6 B, 2006, Pages 5456-5460

  Sugimura, Hiroyuki ^a   Sano, Hikaru ^a   Lee, Kyung Hwang ^a   Murase, Kuniaki ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Excimer lamp; Micropatterning; Photolithography; Self assembled monolayer; Silicon; Vacuum ultraviolet light

Indexed keywords

CHEMICAL BONDS; ETCHING; MONOLAYERS; SILICON; SYNTHESIS (CHEMICAL); ULTRATHIN FILMS; VACUUM APPLICATIONS;

EXCIMER LAMPS; MICROPATTERNING; SELF-ASSEMBLED MONOLAYERS; VACUUM ULTRAVIOLET LIGHT;

PHOTOLITHOGRAPHY;

EID: 33745639065     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.5456     Document Type: Review

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