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Volumn 66, Issue SUPPL. 1, 1998, Pages
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Forcemicroscopy imaging of photopatterned organosilane monolayers: Application to probe alignment in AFMpatterning following photolithography
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Author keywords
[No Author keywords available]
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Indexed keywords
ADHESIVE FORCE;
AFM;
AFM LITHOGRAPHY;
AFM PROBE;
FORCE MICROSCOPY;
FORCE MODULATION MICROSCOPY;
IMAGING MODES;
INTERMITTENT-CONTACTS;
IRRADIATED AREA;
LATENT IMAGES;
LATERAL FORCE MICROSCOPY;
ORGANOSILANE MONOLAYERS;
PHASE-CONTRAST IMAGING;
PHOTOCHEMICAL DEGRADATION;
PHOTOPATTERNED;
SELF-ASSEMBLED;
SPECIFIC LOCATION;
VACUUM ULTRAVIOLET IRRADIATION;
CHEMICAL PROPERTIES;
ELECTRON ENERGY LEVELS;
MECHANICAL PROPERTIES;
MONOLAYERS;
PHOTORESISTS;
PROBES;
ATOMIC FORCE MICROSCOPY;
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EID: 0000715957
PISSN: 09478396
EISSN: 14320630
Source Type: Journal
DOI: 10.1007/s003390051176 Document Type: Article |
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Times cited : (43)
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References (13)
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